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04.07.2022 Kunz precision AG J - Entreprises de services

Mask Measuring Machine MM

The device has two plane mirror interferometer, with which the current position is measured precisely by a laser measurement system.
The laser beam is positioned at the height of the specimen in the extended measurement line. So the relative movement between the microscope and the sample with nanometer resolution can be captured.

The plane mirror with its kinematic edition forms the actual core of the device. A compensation file, which represents the geometry of the plane mirror, is stored in the software. Using this method, the highest accuracies are realized.

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Mask Measuring Machine MM

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